Ultra-clean and high-purity chemicals are essential basic chemical∑ materials in the development of microelectronics technology. They are mainly used in the fields≥ of semiconductors, flat panel displays, and solar photovoltaic industry, as well as microelect∏ronics and optoelectronic device manufacturing. With the rapid development of microelectronics tec hnology, the requirements and standards for ultra-clean and high-purity reagents are &constantly improving. The purity and cleanliness of ultra-clean and high-purity≈ chemicals can significantly influence the yield, electrical property, and reliabilit∑y of integrated circuits. The production process tech↓nology of integrated circuits (IC) with different line widths also has different standards 'for metal impurities and particulate matter in ultra-clean and high-purity chemicaαls, as shown in the following table:

SEMI International Standard Grade and Application

SEMI standard	Grade 1	Grade 2	Grade 3	Grade 4	Grade 5
Metal impurity	≤1ppm	≤10ppb	≤1ppb	≤100ppt	≤10ppt
Partical size control	≤1.0μm	≤0.5μm	≤0.5μm	≤0.2μm	/
Particle control	≤25pcs/ML	≤25pcs/ML	≤5pcs/ML	/	/
Scope of application (IC technology production)	≥1.2μm	0.8-1.2μm	0.2-0.6μm	0.09-0.2μm	≤0.09μm
Application	Discrete device, solar cell	Display panel	Large scale integrated circuit, ultra-high definition display panel	Large scale integrated circuit, ultra-high defi nition display panel

 
Ultra-clean and high-purity chemicals accompany the entire productiσon process of integrated circuits. In the wet process, metal γimpurities in the chemicals can harm the electrical property oεf electronic components, even a very small amount of metal impurities will seriously affect the qua>lity of semiconductor products. Take Au, Pt, Fe, Ni, and Cu for example, they are fas≠t diffusing substances in silicon wafers that can affect the reliabilit∑y and threshold voltage of electronic components and may lead to low breakdown and defe✘cts. Alkali metals such as Na and K can melt into the oxide fil✔m, causing electric leakage of components and low b₩reakdown hazards. P, As, Ab, and Al are shallow lev®el impurities in silicon wafers, which have diffusion effect and can affec$t the number of electrons and holes. With the increaδsing integration of integrated circuits, the requirements for metal ion content i®n ultra-clean and high-purity chemicals are becoming more and more sσtrict.

At present, the commonly used technologies at home and abroad to prepare ultra-clean and high-p§urity reagents mainly include distillation, rectification, resin exchange, recrystalliza₽tion, chemical treatment, membrane processing, and some other technologies. Tβhe membrane processing technology is a physical separation process that doλes not require heating or adding any chemical reagents, ↕and it is an effective way to remove trace metal ion impuritieπs. Based on years of experience in membrane technolπogy application, Guochu Technology has developed a process for remo←ving metal ions from ultra-clean and high-purity chemicals.

Technological process:

 

In order to avoid the contamination of the dissolved matter of the contact πparts, the contact parts with ultra-clean and high-purity chemicals in the technological process shλould be made of high-purity materials. The primary membrane module can reduce the metal ion ∑impurity content to ppb level, the secondary membrane module can reduce the metal ion impurity >content to ppt level, and the tertiary membrane module is the terminal filtration to ens≠ure that the solvent is free of particles, with an accu§racy of up to 5 nm. This process has a good removal effect on metal i•mpurities such as K, Na, Ca, Cu, Fe, and Mg.

Compared with the traditional distillation process, this process has the advantages of a s¥mall footprint, easy-to-operate, sealed system, low energy consumption, and is env§ironmentally friendly. It can be used not only in the produ•ction of ultra-clean and high-purity chemicals, but also in the purification of other hi©gh-purity reagents in the semiconductor manufacturing process, such as resins, polymers, and otβher photolithographic chemical products.

Since the establishment of Guochu Technology (Xiamen) Co., Ltd., ×we have taken membrane separation technology as our core and are committedα to promoting new separation technology. We continuously♠ explore new applications of the new separation membrane technology in the fields ofα microelectronics, metallurgy, chemical industry, machinery, food≥, dairy, beverage, and environment.We can provide targeted comprehensive filtration and purifica¥tion solutions and improve the product quality to meet the highly differentiated needs of our cuφstomers.