Being a new gas/liquid membrane separation process, degassing membrane technolo↕gy makes the removal rate of oxygen in water more than 90%/96% with vacuum αpumping, vacuum pumping + N2 and other methods and makes the removal rate of carbon dioxide ↓in water more than 85%/98% with air blowing, air exhaust + air blowing and ∑other methods, so that the users can also improve the degassing effect with deσgassing membranes in series and other methods.

    1. Carbon dioxide in degassing liquid

    The system water of reverse osmosis and electrostatic ☆desalination or continuous electrostatic desalination is used to reduεce the content of carbon dioxide in water. Electrostatic desalination with high conductivity or ±water penetration of continuous electrostatic desalination wil₽l reduce the resistivity value of its outlet water. The dissolved carboβn dioxide in water is the main reason for high conductivity in water. Degassing ☆membrane provides a clean method of the removal of carbon dioxide from♠ water without maintenance and chemical addition for adjusting PH value, and♦ the removal rate reaches 99.9%. If carbon dioxide is removed before EDI or CDI, φelectrostatic desalination or continuous electrostatic desalination can pro'duce higher water quality for water production, and the reεsistivity of inlet water of the original reverse osmosis +EDI can inc★rease to 18 MB from the original 1.0 MB. When the dissolved carbon dioxide in water is€ removed, the removal rate of silicon and boron by EDI/CDI will alsoε increase, so that it is possible to replace the secondary effluent βof reverse osmosis as electrostatic desalination water inlet with the primary effluent of rever↕se osmosis + degassing membrane.

    2. Oxygen in degassing liquid

    Degassing membrane is widely used for deoxygenation in water and deoxygenation i↔n other liquids. Oxygen has a negative impact on many pr↕ocesses; oxygen will corrode and oxidize materials. In electric power and other induβstrial fields, pipelines, boilers and devices are easily corroded ∑without degassing. Degassing membrane provides a modular method for ★deoxygenation in water, which is easy to operate witho←ut chemical addition and large degassing towers. It also provide★s the benefits of simultaneous removal of oxygen, carbo≤n dioxide and nitrogen control only in one step. When semiconductors are flexibly applied to semγiconductor and membrane panel industrial fields, oxygen with high✔ content will lead to low yield improvement. In the field of microelectronics↑, the degassing membrane can meet the dissolved oxygen index of <1ppb and≠ provide a performance guarantee. A perfect alternat←ive can be completely provided to replace degassing t≠owers.

    Common applied range
 

•   Removal of oxygen in solution (less than 1ppb)
•   Removal of carbon dioxide in solution (less than 1ppm)
•   Removal of nitrogen in solution
•   Control gas humidity
•   Removal of micro-bubbles in liquids (such as photoresist, color ink and emulsion)
•   Add hydrogen into the solution to control the amount of dissolved hydrogen
•   Add hydrogen into the solution to control the amount of dissolved nitrogen
•   Add carbon dioxide gas into the solution